| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-736
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2033-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-112
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-112
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-112
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y70-00 |
| filingDate |
2020-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210139384-A |
| titleOfInvention |
Anionic Polishing Pads Formed by Printing Processes |
| abstract |
Polishing articles used in polishing processes and cleaning processes and methods of making polishing articles are provided. More particularly, implementations disclosed herein relate to composite polishing articles having tunable properties such as hydrophilicity and zeta potential. 3D printed chemical mechanical planarization (CMP) pads containing UV curable acrylic chemicals are generally hydrophobic in nature. This hydrophobic behavior affects the wetting properties of abrasive based polishing slurries, such as ceria based slurries. However, hydrophilic pads are desirable to increase planarization and removal rates while reducing defects. It is also desirable that the zeta potential (Zp) of the pads is adjustable for a wide range of conditions at various pH values. Implementations of the present disclosure include methods of using anionic additives to increase the hydrophilicity of pads and to adjust Zp, and pads produced using such methods. |
| priorityDate |
2019-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |