http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210115957-A

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filingDate 2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeb309c174d41a08a71c8f8997847a20
publicationDate 2021-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210115957-A
titleOfInvention Mask Structure
abstract A mask structure is disclosed. The present invention includes a pressure-sensitive adhesive resin layer, an outer skin member attached to the upper surface of the pressure-sensitive adhesive resin layer, and an inner skin member attached to the lower surface of the pressure-sensitive adhesive resin layer. According to the present invention, it is possible not only to block ultrafine dust through the fine dust filtering function through the adhesive resin layer, but also to sterilize and oxidize harmful bacteria and viruses through the double coating layer of the silver nano coating layer and the citric acid coating layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023074941-A1
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