| abstract |
A selective film deposition method according to an embodiment of the present disclosure is a substrate having a structure in which both a first surface region containing at least one of a metal and a metal oxide and a second surface region containing a non-metallic inorganic material are exposed. , is a selective film deposition method characterized by selectively depositing an organic film represented by the general formula (1) on a first surface region rather than on a second surface region. (In the general formula (1), N is a nitrogen atom. R 1 is a hydrocarbon group having 1 to 30 carbon atoms or a hydrocarbon group which may have a halogen atom, and R 2 , R 3 , R 4 and R 5 are each Independently, it is a hydrocarbon group which may have a hydrogen atom or a hetero atom or a halogen atom having 1 to 10 carbon atoms. However, when the hydrocarbon group has 3 or more carbon atoms, it includes a branched chain or cyclic hydrocarbon group.) |