http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210106100-A

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filingDate 2020-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2eefcc41f440bce9420449d46ac5de3
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publicationDate 2021-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210106100-A
titleOfInvention UV-curable gel nail polish composition with improved acid degradation property and uses thereof
abstract The present invention relates to a UV-curable gel nail polish composition with improved acid-decomposing properties and uses thereof. The gel nail polish composition of the present invention can be cured within a short time and has an acetal structure that can be decomposed after use, and contains a mineral acid. There is a feature that the photocured can be easily decomposed under acidic conditions by treating the generator. Therefore, the composition of the present invention can be easily replaced with a nail care product according to a consumer's preference while minimizing damage to the nail and surrounding skin compared to the prior art, and thus can be very usefully used in the gel nail industry.
priorityDate 2020-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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