http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210103497-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1f22ea6e407dfd06d0892d5298f232c5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0952a993ee98c37a5569427f57b85836 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2201-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C28-343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 |
| filingDate | 2019-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9279ac406890da845616b97a108eebf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d13bf9756a0054a2abfd54fc4caef503 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f017c18652bce31ede5dd1b1b67ac5d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95d8c8e31678473a9f941345397984f8 |
| publicationDate | 2021-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20210103497-A |
| titleOfInvention | Single Run Deposition to Form Supercomposite Structures |
| abstract | The present disclosure provides a method for depositing a multilayer coating on a substrate. The method includes supporting the substrate on a platen comprising an electrically conductive material. The platen is disposed within the deposition chamber, is connected to an electrical power supply, and is electrically isolated from the electrodes. The method further includes reducing a pressure in the deposition chamber to less than 10 Torr and supplying a first feedstock to the substrate. The method then generates a plasma surrounding the substrate and ionizing and/or activating particles in the first feedstock by activating the electrical power supply, wherein the ionized and/or activated particles from the first feedstock are removed from the first feedstock. depositing on the substrate and allowing it to polymerize to form a first layer of the coating on the substrate. wherein the method supplies a second feedstock to the substrate such that the plasma ionizes and/or activates particles in the second feedstock, wherein the second feedstock is different from the first feedstock; and 2 forming a second layer of the coating on the substrate by allowing the ionized and/or activated particles from a feedstock to deposit and polymerize on the substrate. The method is characterized in that the pressure in the deposition chamber does not rise above 700 Torr between the feedstocks supplied thereto. |
| priorityDate | 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.