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filingDate 2019-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_770908c2a4b392d955bf3e257ce2fc3d
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publicationDate 2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210083291-A
titleOfInvention Dry etching gas composition containing sulfur-containing fluorocarbon compound and dry etching method using same
abstract To provide a novel etching gas composition capable of selectively etching SiO 2 with respect to low-k materials (Low-k materials (SiON, SiCN, SiOCN, SiOC)) comprising sulfur-containing compounds. General formula (1): CxFySz (wherein x, y and z are 2 ≤ x ≤ 5, y ≤ 2x, 1 ≤ z ≤ 2), including saturated and cyclic sulfur-containing fluorocarbon compounds A dry etching gas composition.
priorityDate 2018-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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