http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210083019-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_050fc7b82c5d17d9aeb63a7cdcc546b3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-49 |
| filingDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b618bcf2673be7bda8d1eeac5bb2fd48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1cea62fa2bc21e9a7fe5d0f4c015013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00c5581379a33f0ea81efd541fd34ce5 |
| publicationDate | 2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20210083019-A |
| titleOfInvention | Measurement method of suppressor concentration in plating solution |
| abstract | The present invention relates to a method for measuring the concentration of a moderator included in a plating solution, and selectively measuring the concentration of a moderator in a plating solution of a complex additive composition using a cyclic voltammetry method. The present invention is to prepare for deterioration of copper plating properties due to a decrease in the concentration of a moderator in the plating solution generated in the electrolytic plating process. It is possible to selectively and accurately measure the concentration of only the moderator in the plating solution containing the accelerator. |
| priorityDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.