| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2020-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ec445bab0c5a156aba237a0e8e0c2ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_490066517db8a09176cacf92e3c31263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a |
| publicationDate |
2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210077614-A |
| titleOfInvention |
Resist composition and method of forming resist pattern |
| abstract |
A polymer compound (A1) having a structural unit (a10) containing a phenolic hydroxyl group, an acid generator (B0) represented by the general formula (b0-1), a crosslinking agent (C), and a phenolic hydroxyl group in the molecule A negative resist composition containing one or two aromatic compounds (Z) having no carboxyl group (wherein Rb 1 is an organic group and Rb 2 is represented by the following general formula (b0-r-1) or the following general formula (b0-r-1) It is a group represented by a formula (b0-r-2)). [Formula 1] |
| priorityDate |
2019-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |