| abstract |
A base component (A) whose solubility in a developer changes due to the action of an acid, an acid generator component (B) that generates an acid upon exposure, and an acid generated by exposure from the acid generator component (B) A resist composition containing a photodegradable base (D0) that controls diffusion, the photodegradable base (D0) is a resist composition comprising a compound represented by the following general formula (d0), wherein R 011 is the electron is an aryl group having a withdrawing group, R 021 and R 022 are each independently an aryl group which may have a substituent, Z represents a sulfur atom, an oxygen atom, a carbonyl group or a single bond, and X - is a counter no is on [Formula 1] |