http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210063349-A

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filingDate 2019-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_290ae6063b46ed3e5a4c7023fb73608e
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publicationDate 2021-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210063349-A
titleOfInvention Apparatus and method for controlling introduction of EUV target material into EUV chamber
abstract An apparatus and method for controlling introduction of an EUV target material into an EUV chamber are disclosed, wherein the EUV target material is used for plasma formation within the EUV chamber, such as during a period when a dispenser of EUV material is first being started or being adjusted. EUV target material is selectively prevented from entering the EUV chamber when not needed.
priorityDate 2018-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 20.