| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a928391eb92ca4ba7db67b323250595 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D233-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D233-58 |
| filingDate |
2019-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08d4081a1ddb8ba26f4aa344c900b07f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ed7a2340a59462e3d78df40152c92c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011fa88178f9a8b66a27d65025525684 |
| publicationDate |
2021-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210056846-A |
| titleOfInvention |
Method of depositing niobium nitride thin films |
| abstract |
According to an embodiment of the present invention, a method of forming a niobium nitride thin film comprises: an adsorption step of selectively adsorbing a niobium halogen ion compound to a substrate and selectively adsorbing it to a surface of the substrate; And a nitriding step of supplying a nitrogen source to the substrate to react with the niobium halogen ion compound to form niobium nitride. |
| priorityDate |
2019-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |