http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210052601-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D11-132 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2017-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56d8f62d224afe9fc15621b0f0dfa8d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37ac91c829467f160288980f686f3f52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f45b99a71558a2f345209a321b087493 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1135b2a8604366e12287a247866163f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_304c2a6d527ce077e7550ac38d71dc3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b8b693c0349d363884f14c1f852857e |
| publicationDate | 2021-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20210052601-A |
| titleOfInvention | Methods and assemblies for gas flow ratio control |
| abstract | Gas flow control assemblies and methods are provided that are configured to deliver gas to process chamber regions at required flow rates. In some embodiments, the assemblies include one or more MFCs and a back pressure controller (BPC). The assemblies include a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure in the distribution manifold, a process chamber, to control gas flow between the distribution manifold and the process chamber. One or more mass flow controllers connected between the distribution manifold and the process chamber, and a back pressure controller provided in a fluid parallel relationship to the one or more mass flow controllers, wherein accurate flow rate control is achieved. Alternative embodiments include an upstream pressure controller configured to control the flow of carrier gas to control back pressure. Additional methods and assemblies for controlling regional gas flow rates are described with other aspects. |
| priorityDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.