| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4f51818f4238424fa5e29f12c21502ca |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-00 |
| filingDate |
2014-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8acac6beeee7f3643c8237244777905
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_774e3c916564cea19a9b13a9dc15dbed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_406359d2c2dfbc4ff4bb54d8427bb502
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c74e0bfcf1197bbd64317d302832a75b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ce0133894498d85236d4956ad8d9d71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45d8a83615c2071625e35e4e38401d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a59676f94d54dd7e7a94ebf98031fc2a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb6a7987476b6ad9fb884dd2b751d25b |
| publicationDate |
2021-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210046854-A |
| titleOfInvention |
Method for producing alkyl-indium compounds and the use thereof |
| abstract |
The present invention relates to a cost-effective and environmentally friendly manufacturing method of dialkylindium chloride in high yield and with high selectivity and purity. The dialkylindium chloride prepared according to the present invention is also particularly suitable for the preparation of indium-containing precursors in high yield and as a result of high purity and yield on demand and with high selectivity and purity. As a result of the high purity, the indium containing precursors that can be prepared are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by an improved implementation of the method, in particular rapid process control. Due to the targeting and mass use of raw materials with high cost efficiency and low environmental impact, the method is also suitable for use on an industrial scale. |
| priorityDate |
2013-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |