| abstract |
An object of the present invention is to provide a compound capable of forming a composition excellent in patterning accuracy and heat resistance. The present invention is a compound represented by the following general formula (A). (In the formula, R 1 is a monovalent aliphatic group having 1 to 40 carbon atoms, a monovalent aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, a heterocyclic group having 2 to 35 carbon atoms, or a monovalent carbon. Represents a silyl group having 0 to 40 atoms, etc., X is an aliphatic group having 1 to 40 carbon atoms having the same valence as n, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, or 2 to 35 carbon atoms Represents a heterocycle-containing group of, and n represents an integer of 2 or more and 10 or less.) |