| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823462 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 |
| filingDate |
2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adc7349f8259a0af859a22c4e656bc37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b53d6d021312697ed704a42afc7dfa39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5335f0f7b73a8c606e031f18664a708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f98ea966664208074dda8f107f52278 |
| publicationDate |
2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210033388-A |
| titleOfInvention |
Residue removal in metal gate cutting process |
| abstract |
The method includes forming a gate dielectric layer, forming a metal gate strip over a bottom of the gate dielectric layer, and performing a first etching process on the metal gate strip to remove a portion of the metal gate strip. . The first etching process is performed anisotropically. After the first etching process, a second etching process is performed on the metal gate strip to remove the remaining portions of the metal gate strip. The second etching process includes an isotropic etching process. A dielectric material is filled in the recesses left by the etched portions and etched residues of the metal gate strip. |
| priorityDate |
2019-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |