| abstract |
It is an object to provide a photosensitive resin composition excellent in resistance to a strongly alkaline etchant containing 15 to 45 mass% of an alkali metal hydroxide and 5 to 40 mass% of an ethanolamine compound, and an etching method using the photosensitive resin composition. , A compound containing at least (A) an alkali-soluble resin, (B) a photoinitiator and (C) a polymerizable monomer, (C) as a polymerizable monomer, represented by the general formula (i), and m+n is 2 or more and 7 or less Containing 5 to 80 mass%, or (A) the alkali-soluble resin is a copolymer of styrene and methacrylic acid, (C) as a polymerizable monomer, represented by the general formula (i), m + n is 2 or more 20 The said subject was solved by the photosensitive resin composition containing the following compounds, and the content of the compound which m+n is 2 or more and 7 or less and 80 mass% or less, and the etching method using the photosensitive resin composition, and the manufacturing method of a resin structure. |