abstract |
[Problem] An object of the present invention is to provide a salt capable of producing a resist pattern having a good mask error factor (MEF) and a resist composition containing the salt. [Solution means] A salt represented by formula (I) and a resist composition containing the same. [In the formula, R 1 represents a halogen atom, a fluorinated alkyl group, or a hydrocarbon group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-. R 2 and R 3 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-, or R 2 and R 3 is one, and also with the carbon atoms to which they are attached, form a single bond or alkanediyl bridge, -CH 2 contained in the alkanediyl bridge - is, -O-, -S-, -CO You may be substituted with -, -SO-, or -SO 2 -. m1 represents the integer of 0-3. m2 and m3 represent the integer of 0-4. Each of R 4 , R 5 and R 6 represents a hydrogen atom or -X 2 -R 7 . However, at least one of R 4 , R 5 and R 6 represents -X 2 -R 7 . X 2 represents *-CO-O-, *-O-CO-, and the like. R 7 represents a hydrocarbon group containing a cyclic hydrocarbon group which may have a substituent (-CH 2 -contained in the group may be substituted with -O-, -S-, etc.).] |