| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcdab27b778da1d6b6420d581d0c2fe |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2015-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f4784b0ce3e47ec690e4e0c2adad709
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96bb75b1446dc2293d0992883fafb548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36fb35f39680edbbd46080b76e8326b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dee51d9421ca7bf6bfe5b8ea8fdc02a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4a8d6f5da34cfed43f11d7f583c10d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3818eb17f213072f19b65606564b9918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e8d682a8b9f843d49dbe4b4a03f2490
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78f884b60ba1ce2a34ee2fedc957db8d |
| publicationDate |
2021-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20210013325-A |
| titleOfInvention |
Organometallic solution based high resolution patterning compositions and corresponding methods |
| abstract |
Organometallic radiation resist compositions based on tin ions with alkyl ligands are described. Some of these compositions have branched alkyl ligands that provide improved patterning contrast while maintaining high solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in patterning. High resolution patterning having a half-pitch of 25 nm or less and a line width roughness (LRW) of about 4.5 nm or less can be obtained. Synthetic techniques have been developed in which alkyl tin oxide hydroxide compositions with very low metal contamination can be formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102522001-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022164280-A1 |
| priorityDate |
2014-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |