| abstract |
To provide a purification solution and a cleaning method for semiconductor substrates or devices, which are excellent in cleaning performance for removing residues or films made of inorganic substances containing silicon atoms and have a high flash point. A cleaning liquid for a semiconductor substrate or device containing a water-soluble organic solvent, a quaternary ammonium hydroxide, and water, wherein the water-soluble organic solvent is a glycol ether solvent or an aprotic polar solvent having a flash point of 60°C or higher. A residue or film formed on a semiconductor substrate or attached to a device, and a residue or film consisting of at least one selected from the group consisting of a resist and an inorganic substance containing a silicon atom, from the semiconductor substrate or the device using the cleaning solution. A cleaning method comprising cleaning. |