http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200136559-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_42f9d56a00a36e05289ec59bb4aa008f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2019-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dc5ae0bc1861f8159aeae5390d917a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c9a7d2a086e03840e1422ac620f4f8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_083d348dc498a2593c771632eb86284c |
| publicationDate | 2020-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200136559-A |
| titleOfInvention | Highly photosensitive oxime ester based photoinitiator and photosensitive compositions including the same |
| abstract | The present invention provides a high-solubility oxime ester benzoalphacarbazole compound in which precipitation is not generated even when an excessive amount is added to the solvent used in the photopolymerization composition, which can realize high sensitivity due to excellent radical generation efficiency with a small exposure amount. Specifically, it is characterized by introducing a 2-halo ethyl ether group including 1-unit to 3-unit ethyl ether to the nitrogen atom in the benzoalphacarbazole ring substituted with a nitro group. In addition, the oxime ester benzoalphacarbazole compound is phenyl substituted with a methyl group at the ortho position, or phenyl substituted with a methyl group at the ortho, meta and para positions, or phenyl or para position substituted with a Cl or F group at the ortho position. By introducing an ether functional group having a methyl or ethyl group, the absorption of light is excellent in a long wavelength region, and thus, pattern stability, chemical resistance, and adhesion are improved along with high sensitivity and excellent solubility characteristics. Another object of the present invention is a photosensitive composition comprising an oxime ester-based photoinitiator prepared from such a benzoalphacarbazole ring, photocurable ink, photosensitive printing plate, various photoresists, color filter photoresist for LCD, photoresist for resin black matrix A photosensitive resin composition such as a resist or a transparent photosensitive material is provided. |
| priorityDate | 2019-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.