http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200135555-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0044 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4 |
| publicationDate | 2020-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200135555-A |
| titleOfInvention | Active light sensitive or radiation sensitive composition, method for producing active light sensitive or radiation sensitive composition, pattern forming method, and electronic device producing method |
| abstract | In the formation of an ultra-fine pattern, the actinic ray-sensitive or radiation-sensitive composition having excellent resolution and less sensitivity variation, the method of preparing the actinic-ray-sensitive or radiation-sensitive composition, the actinic ray-sensitive or A method for forming a pattern using a radiation-sensitive composition, and a method for manufacturing an electronic device are provided. The actinic-ray-sensitive or radiation-sensitive composition, and the actinic-ray-sensitive or radiation-sensitive composition obtained by a method for producing an actinic-ray-sensitive or radiation-sensitive composition contain a cation and a ligand having a metal atom, and formula ( The value of σ represented by 1) is 2.2 or less. The pattern forming method and the electronic device manufacturing method use the actinic ray-sensitive or radiation-sensitive composition. |
| priorityDate | 2016-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 519.