| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_83dffc287358331deccd774ddf93f551 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-7544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2207-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M37-0015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C39-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C39-026 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L31-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61M37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 |
| filingDate |
2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e0cee1a23a0f93d5cd94cf4122c67ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8319fecc747f05b5996bbd7d473f1ce5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ade874fe33b159cc0b600aad2276b8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a497a344ca6a6744a8a1dfb1dff6a12d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb053557d8d733a61e01d2e7258735df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa02a30d5d829cb9a0379f206833f70f |
| publicationDate |
2020-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200128834-A |
| titleOfInvention |
Manufacturing method and system of microneedle array |
| abstract |
The present invention includes a drying step of drying the liquid negative photosensitive agent 100 to a solid, a bonding step of crushing the dried solid negative photosensitive agent 100 and then bonding to a second base frame to reshape, and a negative photosensitive agent 100 In a state bonded to the mask film 420, an ultraviolet irradiation step of irradiating ultraviolet rays (UV) and the negative photosensitive agent 100 irradiated with ultraviolet rays (UV) is developed with a developer to form a microneedle array mold frame 150 By consisting of a developing step to complete the microneedle array (M) and a template step to complete the microneedle array (M), the diameter is reduced so as not to cause pain when penetrating the skin, and has a sufficient length to penetrate deep into the skin, and is biocompatible and biodegradable. It is intended to provide a method and manufacturing system for manufacturing a microneedle array in which pain and skin damage are minimized when penetrating the skin, since it is made of a material so that excellent sharpness can be realized despite its low strength. |
| priorityDate |
2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |