http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200128088-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2019-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f0a33c356d5d61335189d847330926 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07dae25b2f9ca0a40d0509f89076b256 |
| publicationDate | 2020-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200128088-A |
| titleOfInvention | Resist composition, resist film, pattern formation method, electronic device manufacturing method |
| abstract | Provides a resist composition capable of maintaining line with roughness performance and exposure latitude performance even when stored over time in an environment in which temperature can change, and a resist film, a pattern forming method using the same, and a method for manufacturing an electronic device. . Resin containing a repeating unit having a group that is decomposed by the action of an acid to generate a polar group, and a repeating unit having at least one of a lactone structure, a sultone structure, a sulfonyl structure, and a carbonate structure, and irradiation with actinic rays or radiation As a resist composition containing a compound that generates an acid by the resin, the dispersion degree of the resin is 1.7 or less, Na, K, Ca, Fe, Cu, Mg, Mn, Al, Li, Cr, Ni, Sn, Pb, The metal element content, which is the sum of the contents of each metal element of Zn, Co, Ti, Ag, W, V, Ba, Au, As, Cd, Zr and Mo, is 0.01 mass ppt or more with respect to the total mass of the resist composition. It is 1 mass ppb or less. |
| priorityDate | 2018-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 195.