| abstract |
The present invention relates to an etching apparatus using an etching chamber, comprising: an etchant storage chamber in which an etchant is stored, a connection part in communication with the etchant storage chamber, an etchant storage chamber and an etch chamber that is interlocked through the connection, and an object is etched, It characterized in that it comprises a pressure holding unit for maintaining at least one of the etching liquid storage chamber and the etching chamber in a pressurized atmosphere. |