abstract |
The present invention relates to a method for surface treatment of at least primarily crystalline substrate surfaces 1o, 1o' of substrates 1, 1', by amorphization of the substrate surfaces 1o, 1o', 1o, 1') is formed with an amorphous layer (2, 2', 2"), and the thickness d of the amorphous layer (2, 2', 2") is> 0 nm. In addition, the invention relates to a corresponding device. |