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filingDate 2020-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bca6278d1e7bdcedff8e98932a1f973d
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publicationDate 2020-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200112717-A
titleOfInvention Electrostatic chuck
abstract (Task) Provide an electrostatic chuck that can improve plasma controllability. (Solution means) A ceramic dielectric substrate having first and second main surfaces, a base plate, a first electrode layer formed inside the ceramic dielectric substrate, connected to a high frequency power source, and formed inside the ceramic dielectric substrate, and adsorbed A second electrode layer connected to the power supply is provided, the first electrode layer is formed between the first and second main surfaces in the Z-axis direction, and the dimension of the first electrode layer in the Z-axis direction is Z of the second electrode layer. It is larger than the dimension in the axial direction, and the second electrode layer is formed between the first electrode layer and the first main surface in the Z-axis direction, and the first electrode layer is on the first main surface side and on the opposite side to the first surface. It has a second surface and is fed from the second surface side, the first electrode layer has a first portion including the first surface, contains a ceramic component and a metal component, and the concentration of the ceramic component in the first portion is controlled. 1 Electrostatic chuck higher than the average concentration of ceramic components in the electrode layer.
priorityDate 2019-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 46.