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filingDate 2019-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15fd2811252c8937fc25866159c1bf60
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publicationDate 2020-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200110429-A
titleOfInvention Photoresist remover composition
abstract The present invention relates to a sulfonic acid component selected from the group consisting of camphor sulfonic acid and benzenesulfonic acid of the following structure (I) wherein R is H or C-1 to C-18 n-alkyl; An oxalic acid component having the following structure (II); And a solvent component consisting essentially of an organic solvent component, or a mixture of an organic solvent component and water, wherein the organic solvent component consists of about 100% to about 85% by weight of the solvent component, and the organic solvent component is the solvent (III), (IV), (V), (VI) ( wherein, R represents - (- O-CH 2 -CH 2 -) n '-OH, -OH, and -OC (= O) - CH 3 is selected from the group consisting of, n'is 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII) , (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) as a solvent component which is a mixture of at least two organic solvents selected from or selected from the group It relates to a composition consisting essentially of. Further, the present invention relates to the composition also containing a surfactant component, and also to a method of using any one of these compositions as a resist remover. . , Dipropylene glycol monomethyl ether (III), , , , And .
priorityDate 2018-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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