| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F265-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate |
2020-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24aaba9ea162e2db0d686adf1af7d729
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_897495346d2d632e4f5c9e29b395c607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd6b9d0f9c4f086cca5768a6f099a6ac |
| publicationDate |
2020-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200110209-A |
| titleOfInvention |
Photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, and method of manufacturing plated article |
| abstract |
(Task) It is possible to form a resist pattern that does not change shape even when contacting the plating solution under plating conditions while suppressing the occurrence of cracks, and storage stability that does not cause thickening or gelation even when stored for a certain period of time at room temperature. A photosensitive dry film including a photosensitive resin composition and a photosensitive resin layer composed of the photosensitive resin composition, a method for producing the photosensitive dry film, a method for producing a patterned resist film using the photosensitive resin composition, and the above To provide a method for manufacturing a substrate with a mold using one photosensitive resin composition, and a method for manufacturing a plated article using the substrate with the mold. (Solution means) A photosensitive resin composition containing a resin (A) containing a (meth)acrylic polymer having a carboxyl group, together with a polyfunctional vinyl ether monomer (B), having a phenolic hydroxyl group and/or a mercapto group The compound is contained in a specific amount. (Selectivity) none |
| priorityDate |
2019-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |