http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200098922-A

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filingDate 2019-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b103c502ff7a6e4f685bcb6af6d5340f
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publicationDate 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200098922-A
titleOfInvention Valve Module and Substrate Processing apparatus having the same
abstract The present invention relates to a valve module and a substrate processing apparatus including the same, and more particularly, to a valve module installed in a flow path through which gas activated by plasma flows, and a substrate processing apparatus including the same. The present invention includes a process chamber 100 for forming a substrate processing space S; A valve module 400 installed in a substrate processing apparatus including a flow path 300 coupled to the process chamber 100 and forming a flow path 302 through which gas activated by plasma flows, wherein the flow path 302 In order to open and close the opening and closing plate 410 which is installed to be movable back and forth across the flow path 302 through an open slit 301 provided on one side of the flow path part 300, the opening and closing plate 410 When the first driving part 420 for driving the front-rear movement and the opening/closing plate 410 moves backward to open the flow path 302, it moves between the opening/closing plate 410 and the flow path 302 to open and close the It characterized in that it comprises an opening and closing plate protection unit 430 for preventing the plate 410 from being damaged by activated gas, and a second driving unit 440 for driving the movement of the opening and closing plate protection unit 430 The valve module 400 is started.
priorityDate 2019-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.