| abstract |
[Task] An object of the present invention is to provide a resin capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the resin. [Resolution means] A resin and a resist composition comprising a structural unit represented by formula (a1-5) and a structural unit represented by formula (I). [In formula, R a8 is an alkyl group which may have a halogen atom, a hydrogen atom, or a halogen atom; Z a1 is a single bond or *-(CH 2 ) h3 -CO-L 54 -, h3 is an integer from 1 to 4; L 51 , L 52 , L 53 and L 54 are each independently -O- or -S-; s1 is an integer from 1 to 3; s1' is an integer from 0 to 3; R 1 is a hydrogen atom or a methyl group; A 1 is a single bond or *-CO-O-; R 2 is a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi is an integer from 1 to 3; ni is an integer of 0-4, provided that mi+ni≤5.] |