| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C229-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C211-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C211-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c788af3fd0e79721d5564f64728cea41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da147af6c5d2234835ca331337f8a8c |
| publicationDate |
2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200081312-A |
| titleOfInvention |
Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound |
| abstract |
(Task) A photosensitive dry film comprising a chemically amplified photosensitive composition that is easy to form a resist pattern having a rectangular cross-sectional shape and has a wide depth of focus (DOF), and a photosensitive layer made of the chemically amplified photosensitive composition, and the aforementioned A method for producing a patterned resist film using a chemically amplified photosensitive composition, a method for producing a template with a template using the above-described chemically amplified photosensitive composition, and a method for producing a plated molding using the template with a template, and novel Providing a compound. (Solution) An acid diffusion inhibitor (C) of a specific structure is blended in a chemically amplified photosensitive composition comprising an acid generator (A) that generates an acid upon irradiation with actinic rays or radiation. |
| priorityDate |
2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |