| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c28d4ea320b90ed19f8de42eb1428cc8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23d9b9fbf1a490b968433677e281c500
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ee58dbfd17fa470d924706919876b03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9221481612b3c0030389c79bb645577 |
| publicationDate |
2020-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200077373-A |
| titleOfInvention |
Polishing compositions and methods of using same |
| abstract |
The present invention is at least one abrasive; At least one nitride removal rate reducing agent, acid or base; And water. The at least one nitride removal rate reducing agent may include a hydrophobic portion and a hydrophilic portion; The hydrophobic portion here contains C 12 to C 40 hydrocarbon groups and is separated from the hydrophilic portion by 0 to 10 alkylene oxide groups. The polishing composition has a pH of about 2 to about 6.5 and at least about 3:1 of removal rate for silicon oxide versus removal rate for silicon nitride when polishing a patterned wafer comprising at least a silicon nitride pattern overlaid with silicon oxide. Can have rain |
| priorityDate |
2018-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |