| abstract |
[Task] A new polymer capable of imparting a high-transparency and high-light-resistant film, and capable of forming a fine pattern with a wide wavelength, while being photosensitive, capable of providing a high-transparency, high-light-resistant and high-heat-resistant film after pattern formation. Provided are a resin composition, a method for forming a pattern using the photosensitive resin composition, and a method for manufacturing an optical semiconductor element. [Solution] A photosensitive agent comprising a siloxane polymer containing a polysiloxane skeleton, a silphenylene skeleton, an isocyanuric skeleton and a polyether skeleton in the main chain, and an epoxy group in the side chain, and the siloxane polymer and a photo acid generator. Resin composition. |