| abstract |
The method includes forming a three layer. The third layer is the lower layer; An intermediate layer above the lower layer; It includes an upper layer above the middle layer. The top layer includes a photo resist. The method includes removing the top layer; And removing the intermediate layer using a chemical solution. The chemical solution does not contain potassium hydroxide (KOH), but at least one of quaternary ammonium hydroxide and quaternary ammonium fluoride. |