| abstract |
Repeat units derived from monomer (A) that decomposes upon exposure to generate acid, repeat units derived from monomer (B) having acid labile groups, and repeat units derived from monomer (C) having phenolic hydroxyl groups The polymer containing, and the amount of the remaining monomer (A) in the polymer is 1.0% by weight or less, the monomer solution containing the monomers (A), (B), and (C) in the solvent (S) is supplied to the reactor and the reactor It is produced by carrying out a polymerization reaction within. The monomer solution has a monomer concentration of 35% by weight or more. The solvent (S) contains compounds having the following formulas (S-1) and (S-2). |