abstract |
Provided is a siloxane resin composition excellent in adhesiveness and fine pattern processability. A siloxane resin (A) comprising a structure represented by the following general formula (1), a structure represented by the following general formula (2) and a structure represented by the following general formula (3), a compound (B) having an unsaturated double bond , It is a siloxane resin composition containing a photopolymerization initiator (C) and a solvent (D). (In general formulas (1) to (3), R 1 , R 2 and R 3 each independently represent a group having a hydrogen, hydroxy group, or siloxane bond, or a monovalent organic group having 1 to 30 carbon atoms. X is an alkenyl group, Represents an alkynyl group, a monovalent organic group having a nitrogen atom and a carbon-oxygen unsaturated bond, or a monovalent organic group having a cyclic ether bond Y is 1 having a photoradically polymerizable group (excluding alkenyl groups and alkynyl groups) Represents a monovalent organic group, Z represents a monovalent organic group having an alkali-soluble group, a, b, and c each independently represent an integer of 1 or more, when a to c are 2 or more, a plurality of R 1 , R 2 , R 3 , X, Y and Z may be the same or different, respectively.) |