| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate |
2018-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4b5b07ce9f8f9e28a1c967a5e4979ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dfc37c60c26e93f81e0a048a50e40fb |
| publicationDate |
2020-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200020397-A |
| titleOfInvention |
Cmp slurry composition for polishing metal and method for polishing metal using the same |
| abstract |
At least one of a polar solvent and a nonpolar solvent; Metal oxide abrasives; And a CMP slurry composition for metal wiring polishing comprising at least one compound of formulas (1), (2) and (3), and a metal wiring polishing method using the same. |
| priorityDate |
2018-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |