| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6cbed45eed3945310961a0067a5c5453 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2020-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78d946006cb04c70e9cc9f1e6af7f785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d398c79b350694de1671c656e12368d6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6846d72b9b08755e4b31b2d4309dbb03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3defd0727df9777342e4d18e8b6104ea |
| publicationDate |
2020-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200015683-A |
| titleOfInvention |
Apparatus for processing substrate |
| abstract |
The present invention relates to a substrate processing apparatus which prevents the plasma discharge from being transferred to the substrate, thereby minimizing damage and deterioration of the substrate due to the plasma discharge. The substrate processing apparatus according to the present invention provides a process for providing a reaction space. chamber; And a gas injection module installed in the process chamber to dissociate the process gas by using plasma to spray the substrate onto the substrate, wherein the gas injection module includes a lower frame having a plurality of electrode inserts; And an upper frame having a plurality of protruding electrodes inserted into each of the plurality of electrode insertion portions to have a gap space, and process gas injection holes formed in the plurality of protruding electrodes to inject the process gas onto the substrate. |
| priorityDate |
2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |