| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f94790cf5bf17ef5799ba79a953aa57 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2020-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3b0c01025f2a0ad1aac796a7153fba3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3e95695c38bbba6fe402b3f546b213e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9586054cd9c72aab1a3b4b62f33ff885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1702d9f24d217d7a4b9389d82dddd56 |
| publicationDate |
2020-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200011512-A |
| titleOfInvention |
Method for processing substrate |
| abstract |
The present invention provides a method of seating at least one substrate on a substrate support provided in a process space of a process chamber, moving the substrate by driving the substrate support, and depositing a thin film on the substrate in the process space. It relates to a substrate processing method comprising the step of spraying the process gas for the surface treatment gas and the surface treatment gas for the surface treatment of the thin film on the moving substrate. |
| priorityDate |
2020-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |