| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efd5b0e24c9851e853093cb1a83ced6f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97ef4701681aaa1e5b7bcec5ab5f73de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_faf1728d5e724d1c6ddce95fa1cbc2a3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eedf3d64fbb007b62b100110f889de90 |
| publicationDate |
2020-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200010071-A |
| titleOfInvention |
Chemical mechanical polishing composition, polishinbg slurry, and polishing method for substrate |
| abstract |
Even if the total metal content is reduced, the chemical mechanical polishing composition, chemical, which can achieve a polishing rate equivalent to or higher than that of a conventional abrasive or a significantly higher polishing rate than a conventional abrasive when using the same metal total content as a conventional abrasive Provided are a mechanical polishing slurry and a method for polishing a substrate. The chemical mechanical polishing composition includes an iron-based metal catalyst and a magnesium-based metal catalyst, wherein the metal content of the iron-based catalyst in the total content of the metal catalyst is greater than or equal to the metal content of the magnesium-based metal catalyst. |
| priorityDate |
2018-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |