http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200001518-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D213-55 |
| filingDate | 2019-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f |
| publicationDate | 2020-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200001518-A |
| titleOfInvention | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound |
| abstract | (Problem) Photosensitive dry film provided with the chemically amplified positive type photosensitive resin composition which is easy to form the resist pattern whose cross-sectional shape is square, and the photosensitive resin layer which consists of the said chemically amplified positive type photosensitive resin composition, and the said photosensitive dry film. The manufacturing method, the manufacturing method of the patterned resist film using the chemically amplified positive photosensitive resin composition mentioned above, the manufacturing method of the board | substrate with a mold using the chemically amplified positive photosensitive resin composition mentioned above, and the said mold adhesion It provides the manufacturing method of the plated molding using a board | substrate, and a novel nitrogen-containing aromatic heterocyclic compound. (Solution means) A chemically amplified positive type photosensitive resin comprising an acid generator (A) that generates an acid by irradiation with active light or radiation, and a resin (B) whose solubility in alkali is increased by the action of an acid. The composition contains a nitrogen-containing aromatic heterocyclic compound (C) which is a nitrogen-containing aromatic heterocyclic compound having a specific structure and having a LogS value of -6.00 or less. |
| priorityDate | 2018-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 642.