http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190129992-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2018-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda610e3d51ab514daf7538f668089e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb0045d24003e2a9c6df126e51068ac8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d |
| publicationDate | 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20190129992-A |
| titleOfInvention | Chemically Amplified Resist Materials and Methods of Forming Resist Patterns |
| abstract | In the pattern formation technique using radiation having a wavelength of less than 250 nm, such as EUV, electron beam, ion beam, KrF excimer laser, and ArF excimer laser, the object of the present invention is to provide a resist material capable of achieving high sensitivity and excellent lithography characteristics at a high level. do. The present invention is a chemically amplified resist material used as the photosensitive resin composition in a lithography process including a partial irradiation step, a whole surface irradiation step, a heating step, and a developing step. And a base component that is soluble or insoluble in the developer, and (2) a component that generates a radiation sensitive sensitizer and an acid by irradiation with radiation, wherein the component (2) includes the following components (a) and (b) A compound which contains a component, following (b) and (c) component, or all of following (a)-(c) components, and the said (b) component decomposes by the action of an acid, and is represented by following formula (A) It is a chemically amplified resist material containing a precursor for generating a. |
| priorityDate | 2017-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 233.