| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68721
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32385 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2018-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_752c55727a2e62f3983971c32c80b321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab4262336f9603322d30d8e157314fb6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c30dd6795bae3f17bdd0a1a1a59104a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_296a6f87ecc5b54fa05cffd82b29db48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee8b127803de1ee6b593f047fa6af332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37b4ed8db6b0fb63e7ea212a88c279a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb8b4e0ce8a42ee7ee3f3e656650aaae |
| publicationDate |
2019-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190128638-A |
| titleOfInvention |
Plasma Density Control on Substrate Edge |
| abstract |
Implementations of the present disclosure generally relate to an apparatus for reducing particle contamination on substrates in a plasma processing chamber. The apparatus for reduced particle contamination includes a chamber body and a lid coupled to the chamber body. The chamber body and the lid define the processing volume between the chamber body and the lid. The apparatus also includes a substrate support and an edge ring disposed in the processing volume. The edge ring includes an inner lip disposed over the substrate; A top surface connected to the inner lip; A bottom surface opposite the top surface and extending radially outward from the substrate support; And an inner step between the bottom surface and the inner lip. When the plasma is de-energized, the edge ring shifts the high plasma density region away from the edge region of the substrate to prevent deposition of particles on the substrate being processed. |
| priorityDate |
2017-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |