http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190126323-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad2cd796f8c4dcb425ddcc68707d3444 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-538 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-20 |
| filingDate | 2018-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50b253fa7308e9cfe3c6b7ee6d29753b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cec599cba4e10d6579be3a29fddff50f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ace7d4fb7c063509ca05d22a1f912cc |
| publicationDate | 2019-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20190126323-A |
| titleOfInvention | Polyethylene film for vapor deposition substrates and vapor deposition film using same |
| abstract | Even if the vapor deposition film which carried out vapor deposition using the large vapor deposition machine is provided as a subject, it is providing the polyethylene film for vapor deposition base materials which has the outstanding barrier property. A polyethylene-based film for use as a substrate for a deposition layer, wherein the polyethylene-based film has at least a laminate layer serving as the surface of the deposition layer side and a sealing layer serving as the other surface, and the sealing layer contains inorganic particles, Mohs' hardness of the said inorganic particle contained in the said sealing layer is 3 or less, It is characterized by the polyethylene film for vapor deposition base materials characterized by satisfy | filling at least one of the following (i) and (ii). (i) The average particle diameter of the said inorganic particle contained in the said sealing layer is 5 micrometers or more and 15 micrometers or less (ii) Three-dimensional surface roughness SRa of the said sealing layer surface is 0.2 micrometer or less, and the maximum acid height SRmax of the said sealing layer surface is 6 micrometers or less |
| priorityDate | 2017-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.