| abstract |
The present invention relates to a triblock copolymer comprising an intermediate block having a higher surface energy than both blocks in the middle of the block copolymer, a method for preparing the same, and a method of forming a nanopattern using the same. In addition to increasing the applicability of the production process, it can be used as a generalized method that can be applied to various combinations of block copolymers, not only for specific combinations of copolymers. The nanopattern can be implemented, and can be widely used in various industries such as semiconductor lithography and memory devices. |