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publicationDate 2019-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20190112093-A
titleOfInvention Substrate processing method and substrate processing apparatus
abstract A substrate processing method for removing resist from a surface of a substrate includes a support step of allowing the support member to horizontally support the substrate, and a mixed gas supply step of supplying a mixed gas of water vapor and ozone gas to the vicinity of the surface of the substrate. (T4) and the ultraviolet irradiation process (T6) which irradiates an ultraviolet-ray to the mixed gas supplied near the surface of the said board | substrate.
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