| abstract |
The apparatus and method of the present invention are directed to vaporizing source reactants which are likely to produce or be present in the vapor, wherein the production or presence of such particles is inhibited by the structural or process features of the steam generation system. Such devices and methods are applicable to liquid and solid source reactants, especially solid source reactants such as metal halides such as, for example, hafnium halides. In one particular embodiment, the source reactant consists of the source reactant material in porous monolithic bulk form. The apparatus and methods of the present invention are useful for providing source reactant vapors for applications such as atomic layer deposition (ALD) and ion implantation. |