| abstract |
The present invention relates to a cleaning liquid composition comprising a pyrazolone or a pyrazolone derivative. Specifically, the present invention provides a cleaning liquid composition capable of cleaning metal oxides and metal abrasive particles, which may occur in a chemical mechanical planarization (CMP) process of metal. . According to the cleaning liquid composition according to the present invention, it is possible to selectively adsorb on the copper surface can effectively prevent the etching of copper, and because the etching power is maintained because it does not adsorb to the copper oxide film, the cleaning solution with high corrosion protection effect and copper oxide film removal ability of copper Can provide. |