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publicationDate 2019-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20190105089-A
titleOfInvention Method of manufacturing plasma generating device, substrate processing device and semiconductor device
abstract A high frequency power source for supplying power to a plasma generating unit, and a matching unit provided between the high frequency power source and the plasma generating unit, and matching a load impedance of the plasma generating unit with an output impedance of the high frequency power source; The high frequency power source includes a high frequency oscillator for oscillating high frequency, a directional coupler arranged at a rear end of the high frequency oscillator, for extracting a part of a traveling wave component from the high frequency oscillator and a reflected wave component from the matcher, and the directional coupler. A filter for removing a noise signal applied to the reflected wave component taken out by the second filter; the reflected wave component after passing through the filter; and the traveling wave component taken out by the directional coupler; and the reflected wave component from the matcher is reduced. Feedback control of the matcher It provides technical force with the monitor.
priorityDate 2017-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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