| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_969454e953c06240a3279b7d05cff922 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2003-2237 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-1618
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-1656
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-1625 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-16 |
| filingDate |
2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dee085b6676eebd867c5af944b8889c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_148b4770934fd639b18c062de9cb78a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_826343bdfaf72f545f17212efb2a470d |
| publicationDate |
2019-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190103294-A |
| titleOfInvention |
Formation method of a gas protective film, an adhesion prevention member, and an adhesion prevention member |
| abstract |
(Problem) Provided is a gas protective film which can reduce the adhesion of a substance to a surface of a substrate beyond the effect of reducing the adhesion of a substance by an electrostatic repulsive force. (Solution) A first layer (charge retaining layer 3) containing a charging material and having an electrostatic repulsive force is formed on the surface of the substrate 1, and the surface free energy is controlled on the surface of the first layer. A second layer (functional group layer 4 having a functional group length of less than 1 nm and a functional group of low surface free energy of 50 mJ / m 2 or less) is formed. By forming the gas protective film 2 in this way, it becomes possible to reduce the adhesion of substances by the intermolecular force while maintaining the electrostatic repulsion on the surface of the base 1, so that the gas (1) is more than the effect of reducing the substance adhesion only by the electrostatic repulsion. Adhesion of the substance to the surface can be reduced. |
| priorityDate |
2017-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |